| 线偏振光在手征负折射介质中的古斯汉欣位移特性研究 |
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| 引用本文： | 高建强,柳斌,杨亦红.线偏振光在手征负折射介质中的古斯汉欣位移特性研究[J].量子光学学报,2012,18(2):212-216. |
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| 作者姓名： | 高建强 柳斌 杨亦红 |
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| 作者单位： | 1. 浙江工业职业技术学院,浙江绍兴,312000
2. 浙江工业职业技术学院,浙江绍兴312000;浙江工业大学机械制造及自动化教育部重点实验室,浙江杭州310014 |
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| 摘 要： | 从理论上分析了手征负折射介质中的横向位移特性,给出了线极化波入射条件下发生全反射时的横向位移随入射角的关系曲线。当入射角处于两个本征波的临界角之间时,TE和TM分量对应的横向位移方向相反。而当入射角大于全内反射角时,两个分量都将朝着正方向发生横向位移。通过比较发现手征负折射介质中的古斯汉欣位移特性与常规介质和一般手征介质也有着很大的不同之处。
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| 关 键 词： | 手征负折射 古斯汉欣位移 全内反射 |
| 收稿时间： | 2012/2/4 |
Research on the Goos-Hanchen shift of Linearly Polarized Light in the Chiral Negative Refraction Medium |
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| GAO Jian-qiang
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LIU Bin
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YANG Yi-hong.Research on the Goos-Hanchen shift of Linearly Polarized Light in the Chiral Negative Refraction Medium[J].Acta Sinica Quantum Optica,2012,18(2):212-216. |
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| Authors: | GAO Jian-qiang LIU Bin YANG Yi-hong |
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| Institution: | 1,2(1.Zhejiang Industry Polytechnic College,Shaoxing 312000,China;2.Key Laboratory of Mechanical Manufacture and Automation,Ministry of Education,Zhejiang University of Technology,Hangzhou 310014,China) |
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| Abstract: | The lateral shift in chiral negative refraction medium is analyzed theoretically, lateral shift curves vs incident angle when total internal reflection takes place as for a linearly polarized incident wave. When incident angle is between the critical angles of two eigen-waves, the shift directions of TE and TM component are opposite. However once incident wave is larger than the total internal reflection angle, both TE and TM wave will have positive lateral shift. Compared with common medium and normal chiral medium, we find that the Goos-Hanchen shift characteristic in chiral negative refraction medium is very different form them. |
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| Keywords: | chiral negative refraction Goos-Hanchen shift total internal reflection |
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