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Cover Picture: Contrib. Plasma Phys. 9/2012 |
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| Abstract: | SEM micrograph of a preliminary result of Si etching profile obtained for alternatively intermittent flow recipe at condition of 60% SF6/40% CH4 duty cycle (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) |
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