Preparation and Properties of Anti-Reflection/Anti-Static Thin Films for Cathode Ray Tubes Prepared by Sol-Gel Method Using Photoirradiation |
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| Authors: | T. Ohishi S. Maekawa T. Ishikawa D. Kamoto |
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| Affiliation: | (1) Hitachi Research Laboratory, Hitachi Ltd., 7-1-1 Omika-cho, 319-12 Hitachi-shi, Ibaraki-ken, Japan |
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| Abstract: | A new technique for preparing anti-reflection/anti-static thin films for CRTs at low temperature has been developed. Double-layered films of SiO2/SnO2 were formed on a CRT panel surface by the sol-gel method using photoirradiation. The new method makes it possible to reduce heat treatment temperature (°C) by almost 50% and treatment time to approximately 33% of the conventional levels. |
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| Keywords: | sol-gel method photoirradiation anti-reflection/anti-static film |
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