Preparation and Properties of Anti-Reflection/Anti-Static Thin Films for Cathode Ray Tubes Prepared by Sol-Gel Method Using Photoirradiation |
| |
| Authors: | T Ohishi S Maekawa T Ishikawa D Kamoto |
| |
| Institution: | (1) Hitachi Research Laboratory, Hitachi Ltd., 7-1-1 Omika-cho, 319-12 Hitachi-shi, Ibaraki-ken, Japan |
| |
| Abstract: | A new technique for preparing anti-reflection/anti-static thin films for CRTs at low temperature has been developed. Double-layered
films of SiO2/SnO2 were formed on a CRT panel surface by the sol-gel method using photoirradiation. The new method makes it possible to reduce
heat treatment temperature (°C) by almost 50% and treatment time to approximately 33% of the conventional levels. |
| |
| Keywords: | sol-gel method photoirradiation anti-reflection/anti-static film |
| 本文献已被 SpringerLink 等数据库收录！ |
