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A Passband-Flattened EDG Demultiplexer with an Air-Trenched Taper
Authors:Zhongyan Sheng
Affiliation: a Centre for Optical and Electromagnetic Research, State Key Laboratory of Modern Optical Instrumentation, Zhejiang University, Yu-Quan, Hangzhou, People's Republic of China.
Abstract:
A novel passband flattening method for a planar waveguide demultiplexer based on an etched diffraction grating is presented. A strongly confined taper is formed by etching air trenches at both sides of the input waveguide. The geometric parameters of the taper are optimized by considering the figure of merit, ripple, and loss. Numerical simulation for a design example is given to illustrate the passband flattening method.
Keywords:demultiplexer  passband flattening  air trench  etched diffraction grating  photonic integrated circuit
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