A Passband-Flattened EDG Demultiplexer with an Air-Trenched Taper |
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Authors: | Zhongyan Sheng |
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Affiliation: | a Centre for Optical and Electromagnetic Research, State Key Laboratory of Modern Optical Instrumentation, Zhejiang University, Yu-Quan, Hangzhou, People's Republic of China. |
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Abstract: | ![]() A novel passband flattening method for a planar waveguide demultiplexer based on an etched diffraction grating is presented. A strongly confined taper is formed by etching air trenches at both sides of the input waveguide. The geometric parameters of the taper are optimized by considering the figure of merit, ripple, and loss. Numerical simulation for a design example is given to illustrate the passband flattening method. |
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Keywords: | demultiplexer passband flattening air trench etched diffraction grating photonic integrated circuit |
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