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Analysis of PPMMA films from oxygen plasma using X-ray photoelectron spectroscopy |
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| Authors: | Beena Annie Kuruvilla Madhukar Zambre Suresh Gosavi Sucheta Gorwadkar A Datta S A Gangal S K Kulkarni |
| Abstract: | Plasma polymerized methyl methacrylate (PPMMA) films have been synthesised on silicon substrates in RF glow discharge using oxygen plasma. The electron beam delineation sensitivity of the PPMMA films has been studied systematically by varying oxygen and monomer flow rates. X-ray photoelectron spectroscopy (XPS) analysis clearly illustrates how C/O ratio in the films determines the properties of PPMMA films as electron beam resist. © 1994 John Wiley & Sons, Inc. |
| Keywords: | plasma polymerization electron beam resist X-ray photoelectron spectroscopy |