Infrared hole burning in matrix-isolated 1,2-difluoroethane with a tunable diode laser |
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Authors: | Martin Dubs L Ermanni Hs.H Günthard |
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Affiliation: | Laboratory for Physical Chemistry, Swiss Federal Institute of Technology, ETH-Zentrum, CH-8092 Zürich, Switzerland |
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Abstract: | Infrared hole burning within the absorption profile of the ν17 vibrational transition of 1,2-difluoroethane matrix-isolated in solid Ar, Kr, and N2 was observed. These measurements allowed the determination of the homogeneous and inhomogeneous linewidth ( at 2.5 K in Kr, ). The temperature dependence of the homogeneous linewidth is explained in terms of vibrational relaxation as well as dephasing processes. A detailed analysis of the changes in the absorption profile with irradiation and calculation of the potential energy surface for rotation of the molecule in the matrix cage suggest a reorientation of the molecules in the matrix to be the cause of the observed hole burning. |
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