Gas‐phase reactions of SiHn+ (n = 1,2) with NF3: A computational investigation on the detailed mechanistic aspects

The mechanism of the gas‐phase reactions of SiH_n⁺ (n = 1,2) with NF₃ were investigated by ab initio calculations at the MP2 and CAS‐MCSCF level of theory. In the reaction of SiH⁺, the kinetically relevant intermediates are the two isomeric forms of fluorine‐coordinated intermediate HSi‐F‐NF₂⁺. These species arise from the exoergic attack of SiH⁺ to one of the F atoms of NF₃ and undergo two competitive processes, namely an isomerization and subsequent dissociation into SiF⁺ + HNF₂, and a singlet‐triplet crossing so to form the spin‐forbidden products HSiF⁺ + NF₂. The reaction of SiH₂⁺ with NF₃ involves instead the concomitant formation of the nitrogen‐coordinated complex H₂Si‐NF₃⁺ and of the fluorine‐coordinated complex H₂Si‐F‐NF₂⁺. The latter isomer directly dissociates into NF₂⁺ + H₂SiF, whereas the former species preferably undergoes the passage through a conical intersection point so to form a H₂SiF‐NF₂⁺ isomer, which eventually dissociates into H₂SiF⁺ and NF₂. © 2012 Wiley Periodicals, Inc.