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10 ps High Power Laser System at 248 nm
Authors:YUAN Xiao  DING Guilin  Liu Jingru  LAU¨U Baida  Julius Goldhar
Affiliation:1. Physics Department, Sichuan University;Northwest Institute of Nuclear Technology, P.O.Box 69-13
2. Physics Department, Sichuan University,
3. Northwest Institute of Nuclear Technology, P.O.Box 69-13,
4. Electrical Engineering Department, University of Maryland,College Park, MD 20742, USA
Abstract:
A simple 10 ps KrF laser system consisting of quenched dye laser oscillator pumped by a XeCl laser, a distributed feedback dye laser (DFDL), a three-stage dye amplifier and a two-stage KrF amplifier are described. The output of the laser system is 140 mJ with 10 ps pulse width by using polarization-multiplexing amplification. A focused output laser intensity of about 4×1015 W/cm2 is obtained. The saturation fluence for KrF laser is obtained with this laser.
Keywords:
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