Resonant frequency-domain interferometry via third-harmonic generation

A method for measuring resonances using a combination of third-harmonic generation and frequency-domain interferometry is described and demonstrated in an index-matched dielectric material. The phase of the third-harmonic spectrum of a pulse generated from a resonant NdAlO(3) thin film and a temporally displaced sapphire substrate pulse was measured by analyzing the spectral interference pattern. The appropriate combination of substrate and film signals was obtained by translating the sample through the laser focus while observing the third-harmonic intensity.