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Limits on rough-particle sizing with low-defocus interferometric imaging
Institution:1. Key Laboratory of Green Processes and Engineering, Institute of Process Engineering, Chinese Academy of Sciences, Beijing 100190, China;2. Agricultural & Biosystems Engineering, South Dakota State University, Brookings, SD 57006, USA;3. Art College, Hubei University of Economics, Jiangxia District, Wuhan 430205, China;1. Institute of Automotive Engineering, School of Mechanical Engineering, National Engineering Laboratory for Automotive Electronic Control Technology, Shanghai Jiao Tong University, Shanghai 200240, China;2. Institute of Nano Biomedicine and Engineering, Department of Instrument Science and Technology, Key Laboratory for Thin Film and Microfabrication Technology of Ministry of Education, School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai 200240, China;1. School of Chemistry and Chemical Engineering, Guangxi University, Nanning 530004, China;2. College of Chemistry and Life Science, Guangxi Teachers Education University, Nanning 530001, China;1. Key Laboratory of Energy Thermal Conversion and Control of Ministry of Education, School of Energy and Environment, Southeast University, Nanjing, Jiangsu 210096, PR China;2. School of Environmental Science and Engineering, Suzhou University of Science and Technology, Suzhou, Jiangsu 215009, PR China
Abstract:We present a rigorous theoretical model for the influence of the aperture in interferometric out-of-focus imaging. We investigate the role of this effect on the properties of speckle-like patterns generated by irregular, rough particles. Finally, we determine the conditions under which these patterns are no longer representative of particle size but of the aperture itself and the defocus parameter.
Keywords:Interferometric out-of-focus imaging  Irregular rough particles  Generalized Huygens–Fresnel integrals
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