氩气对MPCVD制备纳米金刚石薄膜的影响

纳米金刚石(NCD)在精密机械、光学真空窗口等领域具有广泛的应用.利用微波等离子体化学气相沉积法(MPCVD)以乙醇、氩气和氢气为气源,通过改变氩气浓度探究氩气对NCD膜光学性质的影响,利用扫描电子显微镜(SEM)、Raman光谱、X射线衍射仪(XRD)和红外光谱对不同氩气浓度沉积的薄膜的结构、成分和性质进行表征.结果表明,随着氩气浓度升高,NCD膜表面粗糙度降低,同时金刚石的纯度下降,在此作用下,NCD膜的透光性随氩气浓度先升高后降.

Influence of Ar on Nano Diamond Thin Films Prepared by MPCVD

Nano Diamond(NCD) has a wide range of applications in precise instruments and optical vacuum windows filed.Microwave plasma chemical vapor deposition(MPCVD) was used to synthesize NCD thin films using CH3CH2OH, Ar and H2 as gas resource.The effect of argon concentration on the films optical properties were studied, The structure,component and property of NCD thin films deposited under different Ar concentrations were investigated by scanning electron microscopy(SEM), Raman spectroscopy, X-ray diffraction(XRD)and infrared spectroscopy(FTIR).The result shows that, with the increasing of Ar concentration, surface roughness and the diamond phase purity decreases, the optical transmittance increases first and then decreases.