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Accurate ultra‐low‐energy secondary ion mass spectrometry analysis of wide bandgap GaN/InxGa1–xN structures using optical conductivity enhancement
Authors:R. J. H. Morris  M. G. Dowsett  R. Beanland  P. J. Parbrook  C. F. McConville
Affiliation:1. Department of Physics, University of Warwick, Gibbet Hill Road, Coventry CV4 7AL, UK;2. EPSRC Centre for III‐V Technologies, University of Sheffield, Mappin Street, Sheffield S1 3JD, UK
Abstract:Ultra‐low‐energy secondary ion mass spectrometry has been used to undertake a structural analysis of GaN–InxGa1–xN (x ~0.25) quantum wells used in optoelectronic devices. The high resistivity of intrinsic GaN–InxGa1–xN restricts the necessary electrical path between the analyzed area and the instrument ground potential resulting in surface charge accumulation. Consequently, unstable and unrepresentative depth profiles tend to be produced. A technique known as optical conductivity enhancement (OCE) has been used during depth profiling to reduce the material resistivity. This creates an electrical path between the sample and holder, eliminating charge build up and resulting in accurate depth profiles. Copyright © 2010 John Wiley & Sons, Ltd.
Keywords:
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