| ICP—AES测定三甲基镓中痕量杂质 |
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| 引用本文： | 张波珍 王春梅. ICP—AES测定三甲基镓中痕量杂质[J]. 光谱学与光谱分析, 1997, 17(6): 53-66 |
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| 作者姓名： | 张波珍 王春梅 |
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| 作者单位： | 电子部第四十六研究所 |
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| 摘 要： | ![]()
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| 关 键 词： | ICP－AES 三甲基镓 砷化镓单晶薄膜 杂质 |
DETERMINATION OF IMPURITIES IN TRIMETHYLGALLIUM BY ICP AES |
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| S Zhang,C Wang. DETERMINATION OF IMPURITIES IN TRIMETHYLGALLIUM BY ICP AES[J]. Spectroscopy and Spectral Analysis, 1997, 17(6): 53-66 |
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| Authors: | S Zhang C Wang |
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| Affiliation: | The 46 Institute of Electric Ministry, 300192 Tianjin. |
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| Abstract: | ![]()
In this article,it was reported that ICP AES was used to analyze impurities in trimethylgallium.Gallium matrix could not produce background and spectral overlapping interferences. |
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| Keywords: | ICP AES Trimethylgallium |
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