Numerical simulation and validation of the Peltier pulse marking of solid/liquid interfaces

We describe a numerical approach of the solidification of binary alloys to study the motion of a crystal/melt interface submitted to current pulses involving a modification of the dopant concentration field. For the thermal aspect, the Thomson effect, the Peltier effect and Joule heating have been included in the heat flow. For the solutal segregation, our model is based on mass transports which occur in the liquid phase, namely diffusion and convection. Numerical computations are validated by comparison with experimental data and thus could find applications in the prediction of the effects of Peltier pulse marking in crystal growth.