A beamline for time resolved photoelectron microscopy on magnetic materials at the Swiss light source

We describe the “Surface/Interface: Microscopy” beamline currently under construction at the Paul Scherrer Institut. This beamline will use a photoemission electron microscope to study the electronic and magnetic structure of materials. Its photon energy range will be 94–2000 eV.

To allow time resolved measurements with millisecond resolution we use a new scheme allowing to switch the photon helicity optically without perturbing the electron orbit. Two identical elliptical insertion devices are placed behind each other in the same straight section. They can produce light with opposing helicities. These two sources are separated horizontally by introducing a small static parallel offset in the electron orbit. Switching between the two rays of opposite helicities is done mechanically at the horizontal focus behind the monochromator. The two sources are brought to overlap on the sample by slightly defocussing the refocussing mirror.

A commercial microscope (Δx20 nm resolution) is adapted to the synchrotron by various upgrades. These include a software combining microscope and beamline control, a computer controlled mechanical alignment system, a separate sample preparation chamber, and sample cooling using liquid nitrogen. The beamline will be available for user operation in 2002.