TeOx薄膜结构及短波长静态记录特性的研究

以真空蒸镀法在K9玻璃基底上制备了TeO_x单层薄膜.使用X射线光电子能谱仪(XPS)、X射线衍射仪(XRD)、原子力显微镜(AFM)对薄膜的结构进行了分析.实验结果表明,薄膜是由晶态Te分散在非晶态TeO₂基体中形成的混合体系,TeO₂基体的存在增强了Te的抗氧化性能;薄膜具有精细粒状结构和粗糙的表面;退火后薄膜的反射率增加和Te向表面的偏析、重聚集及表面粗糙度的降低有关.采用波长为514.4nm的短波长静态记录仪对薄膜静态记录性能的测试结果表明:薄膜具有良好的记录灵敏性,在记录功率1.5mW、脉宽50ns时就可产生较高的反射率衬比(度).研究结果为选择合适掺和物使TeO_x薄膜实际用作高密度光存储介质有重要意义.

STRUCTURAL PROPERTIES AND STATIC OPTICAL RECORDING PERFORMANCE OF TeOx THIN FILMS USING SHORT-WAVELENGTH LASER

Monolayer TeO x thin films were deposited on K9 glass substrates by vacuum evaporation.The structural properties of the films were analyzed by X ray photo electron spectroscopy (XPS),X ray diffractometer (XRD) and atomic force microscope (AFM).It was found that the films represented a two component system comprising tellurium particles dispersed in an amorphous TeO 2 matrix.The dispersed tellurium particles in the as deposited films were in crystalline state.The existence of TeO 2 enhanced the stability of tellurium particles.The films had finely granular structure and coarse surface.Reflectivity increase of the films after being annealed was related the segregation and redistribution of Te in TeO 2 matrix and decrease of mean roughness.The reflectivity contrast was relatively high after being recorded using short wavelength laser (514.4nm) with writing power higher than 1.5mW and short pulse width (50ns).The films had good writing sensitivity.The results were helpful to select proper additives to TeO x thin films using for high density optical storage medium.