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Bending properties of two- and three-dimensional-shaped nanoparticles fabricated via substrate conformal imprint lithography
Authors:Sabrina Reuter  Marek A Smolarczyk  André Istock  Uh-Myong Ha  Olga Schneider  Natalie Worapattrakul  Safoura Nazemroaya  Hai Hoang  Ludmilla Gomer  Frank Pilger  Markus Maniak  Hartmut Hillmer
Institution:1.Institute of Nanotechnologies and Analytics, Department of Technological Electronics,University of Kassel,Kassel,Germany;2.Department of Cell Biology,University of Kassel,Kassel,Germany;3.Energy and Environment Division,Paul Scherrer Institute,Villigen PSI,Switzerland;4.Center for Interdisciplinary Nanostructure Science and Technology (CINSaT),Kassel,Germany
Abstract:Nanoimprinting enables the implementation of nanoparticle shapes with complex 2D shapes involving different materials. In addition to these objects, this article presents 3D-shaped nanoparticles fabricated by substrate conformal imprint technique. The imprint polymer AMONIL is used either in pure form or in combination with fluorescent dyes for the preparation of particles. The substrate conformal imprint lithography process, including etching and particle release, is conducted for both materials in a similar fashion. In this work, cuboidal particles with a high aspect ratio (1:120) are compared to particles with a T-shaped cross section with respect to their abilities to enhance or reduce their stiffness. Additionally, particles with a high aspect ratio are compared to particles with a lower aspect ratio (1:20). The local stiffness is found to depend strongly on the particle thickness and the geometry of their cross section. Thicker and 3D T-shaped particles present higher local stiffness than thinner and 2D cuboidal-shaped particles. The local bending angle was determined to be 77° for 2D-shaped particles and 83° for 3D-shaped particles, of the same total height of 176 nm. Very thin particles (<50 nm) of high aspect ratio prefer to curl finally forming loops.
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