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Formation of metallic Ni nanoparticles on titania surfaces by chemical vapor reductive deposition method
Authors:Yoshinaga Masaki  Takahashi Hideyuki  Yamamoto Katsutoshi  Muramatsu Atsushi  Morikawa Takeshi
Affiliation:Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai 980-8577, Japan.
Abstract:Metallic Ni nanoparticles were successfully prepared on the surface of titania thin film substrate by a novel method, named as chemical vapor reductive deposition (CVRD) method. The growth of the nanoparticles was based on the specific adsorption and heterogeneous nucleation on the surface of substrate, not via vapor-phase formation and subsequent sedimentation. The nanoparticle size was found to be well controllable between 10 and 30 nm by the preparation time and vapor pressure of metal complex precursor. ESCA and electron diffraction results clearly demonstrated Ni nanoparticles as metallic. Titania thin film with metallic Ni nanoparticles on its surface showed high efficiency in their photocatalysis of hydrogen evolution from decomposition of ethanol.
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