Selective and Sequential Re‐Assembly of Patterned Block Copolymer Thin Film for Fabricating Polymeric,Inorganic, and Their Composite Nanostructured Arrays

We report that the nanostructures of poly(styrene‐block‐4‐vinylpyridine) block copolymer (PS‐b‐P4VP) thin film on a wafer substrate can be re‐assembled by sequential vapor treatment using selected solvents. Metal or other inorganic nanoparticles that were randomly pre‐loaded inside or on the surface of PS‐b‐P4VP thin film could be pulled to the rim of PS and P4VP along with the movements of PS and P4VP blocks during the treatment. As a result, the patterned polymeric or inorganic/polymer composite nanoisland and nanoring arrays were fabricated.