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Strain relaxation at cleaved surfaces studied by atomic force microscopy
Authors:F. Lelarge  O. Dehaese  E. Kapon  C. Priester
Affiliation:(1) Department of Physics, Swiss Federal Institute of Technology Lausanne, CH-1015 Lausanne EPFL, Switzerland (Fax: +41-21/693-5480, E-mail: lelarge@dpmail.epfl.ch), CH;(2) Institut d’Electronique et de Microélectronique du Nord, Département ISEN, BP 69, 59652 Villeneuve d’Ascq cedex, France, FR
Abstract:
Atomic force microscopy (AFM) in air is used to study the (110) cleaved surface of strained (100) InxGa1-xAs/ InP heterostructures for different compositions and thicknesses of the ternary compound layers. We find that the elastic strain relaxation induces a surface undulation of a few ? amplitude, even for very small misfits, provided the layers are thick enough. Using finite-element calculations of the strain relaxation near the cleaved edge, we reproduce quantitatively the AFM observations for compressive- as well as for tensile-strained layers with an accuracy better than 0.1 nm. This demonstrates the ability of AFM to quantify strain distributions by making use of surface profile measurements. Received: 9 November 1998 / Accepted: 11 March 1999 / Published online: 7 July 1999
Keywords:PACS: 78.66.Fd   62.20.Fe   61.16.Ch
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