Production of charge-induced X-rays during PIXE studies using light and heavy ion-beams

A recently discovered phenomenon of excessively high X-ray production is discussed. The high yield is attributed to the build-up of potential on non-conducting targets irradiated with accelerated ion beams, and the subsequent discharge. Ion-beams of¹H⁺,¹H₂ ⁺,²H⁺,²H₂ ⁺,³He⁺,³He²⁺,⁴He⁺,¹⁴N⁺,¹⁴N²⁺,¹⁶O⁺ and²⁰Ne⁺ were used. A new mechanism of X-ray excitation is proposed. The increased X-ray fluxes produced by this process are suitable for analytical applications of high specificity. The mechanism of excitation associated with the process, factors affecting the high X-ray yields, applications and a general overview of the studies undertaken with the various ion beams are given.