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La4(Si5.2Ge2.8O18)(TeO3)4 and La2(Si6O13)(TeO3)2: Intergrowth of the lanthanum(III) tellurite layer with the XO4 (X=Si/Ge) tetrahedral layer
Authors:Fang Kong  Hai-Long Jiang  Jiang-Gao Mao
Institution:a State Key Laboratory of Structural Chemistry, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou 350002, PR China
b The Graduate School of the Chinese Academy of Sciences, Beijing 100039, PR China
Abstract:Two novel lanthanum(III) silicate tellurites, namely, La4(Si5.2Ge2.8O18)(TeO3)4 and La2(Si6O13)(TeO3)2, have been synthesized by the solid state reactions and their structures determined by single crystal X-ray diffraction. The structure of La4(Si5.2Ge2.8O18)(TeO3)4 features a three-dimensional (3D) network composed of the (Ge2.82Si5.18)O18]4− tetrahedral layers and the La4(TeO3)4]4+ layers that alternate along the b-axis. The germanate-silicate layer consists of corner-sharing XO4 (X=Si/Ge) tetrahedra, forming four- and six-member rings. The structure of La2(Si6O13)(TeO3)2 is a 3D network composed of the Si6O13]2− double layers and the La2(TeO3)2]2+ layers that alternate along the a-axis. The Si6O13]2− double layer is built by corner-sharing silicate tetrahedra, forming four-, five- and eight-member rings. The TeO32− anions in both compounds are only involved in the coordination with La3+ ions to form a lanthanum(III) tellurite layer. La4(Si5.2Ge2.8O18)(TeO3)4 is a wide band-gap semiconductor.
Keywords:Solid state reactions  Crystal structures  Lanthanum(III) tellurite  Layered silicates
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