首页 | 本学科首页   官方微博 | 高级检索  
     检索      

MoSi2能隙的高压调制
引用本文:张海峰,李永平.MoSi2能隙的高压调制[J].高压物理学报,1994,8(3):200-204.
作者姓名:张海峰  李永平
作者单位:中国科技大学物理系,中国科技大学结构分析开放研究实验室,华中师范大学物理系
摘    要: 采用LMTO-ASA方法,对过渡金属MoSi2在高压下的电子结构性质进行了研究,计算中考虑了除自旋-轨道耦合外的所有相对论效应。结果表明:随着压缩度增加,MoSi2小的能隙变宽,Mo的d电子与Si的p电子杂化增强,原子间相互作用增大,晶体在高压下更加紧密结合。这一能隙随压力增大而增大的结果,与非导体在高压下金属化的特性相反。

关 键 词:LMTO-ASA方法  电子结构  高压
收稿时间:1993-07-27;

MoSi_2 BAND GAP MODULATION AT HIGH PRESSURE
ZHANG Hai-Feng,LI Yong-Ping,HUANG Xin-Tang.MoSi_2 BAND GAP MODULATION AT HIGH PRESSURE[J].Chinese Journal of High Pressure Physics,1994,8(3):200-204.
Authors:ZHANG Hai-Feng  LI Yong-Ping  HUANG Xin-Tang
Institution:1. Department of Physics, University of Science and Technology of China, Hefei 230026, China;2. Structure Research Laboratory, University of Science and Technology of China, Hefei 230026, China;3. Department of Physics, Huazhong Normal University, Wuhan 430070, China
Abstract:The electronic structure of transition metal disilicides MoSi_2 at high pressure was studied by using LMTO-ASA method.All the relativistic effects except spin-orbit coupling were considered.The results indicate that,with the compressibility increasing,the width of valence band became wider which shows the interaction between Mo d electrons and Si p electrons became larg-er,the cohesion of crystal increases.Should we say that,this result is conflict to the rule of metal-ization of nonconductors at high pressure.
Keywords:LMTO-ASA method  electronic structure  high pressure  
本文献已被 CNKI 维普 等数据库收录!
点击此处可从《高压物理学报》浏览原始摘要信息
点击此处可从《高压物理学报》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号