Structural analysis of composite metal-insulator materials by small-angle x-ray scattering |
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Authors: | I. V. Rozhanskii D. A. Zakheim T. N. Vasilevskaya S. A. Gurevich |
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Affiliation: | (1) Ioffe Physicotechnical Institute, Russian Academy of Sciences, Politekhnicheskaya ul. 26, St. Petersburg, 194021, Russia;(2) Grebenshchikov Institute of Silicate Chemistry, Russian Academy of Sciences, ul. Odoevskogo 24/2, St. Petersburg, 199155, Russia |
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Abstract: | A small-angle x-ray scattering study of the structure of Cu: SiO2 composite films obtained by magnetron cosputtering is reported. The experimental spectra are analyzed by direct numerical simulation of scattering from a polydisperse system of spherical particles with a high volume concentration. The calculated scattering spectra were found to fit well to the experiment if a log-normal particle distribution in size is assumed, and the parameters of this distribution were determined. |
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