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Optical characteristics of H2O-based and O3-based HfO2 films deposited by ALD using spectroscopy ellipsometry |
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| Authors: | Xiaojiao Fan Hongxia Liu Bo Zhong Chenxi Fei Xing Wang Qianqiong Wang |
| Institution: | 1. School of Microelectronics, Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices, Xidian University, Xi’an, 710071, China |
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