Review of a direct epitaxial approach to achieving micro-LEDs |
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Institution: | 1.Department of Electronic and Electrical Engineering, Southern University of Science and Technology, Shenzhen 518055, China;2.Department of Electronic and Electrical Engineering, The University of Sheffield, Sheffield S1 3JD, United Kingdom |
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Abstract: | There is a significantly increasing demand of developing augmented reality and virtual reality (AR and VR) devices, where micro-LEDs (μLEDs) with a dimension of ≤ 5 μ m are the key elements. Typically, μLEDs are fabricated by dry-etching technologies, unavoidably leading to a severe degradation in optical performance as a result of dry-etching induced damages. This becomes a particularly severe issue when the dimension of LEDs is ≤ 10 μ m. In order to address the fundamental challenge, the Sheffield team has proposed and then developed a direct epitaxial approach to achieving μLEDs, where the dry-etching technologies for the formation of μLED mesas are not needed anymore. This paper provides a review on this technology and then demonstrates a number of monolithically integrated devices on a single chip using this technology. |
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Keywords: | micro-LED epitaxial growth gallium nitride display |
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