|
|||||
|
|
Photorefractive multiple quantum wells at 1064 nm |
|
| Authors: | Iwamoto S Taketomi S Kageshima H Nishioka M Someya T Arakawa Y Fukutani K Shimura T Kuroda K |
| Abstract: | We have fabricated photorefractive InGaAs/GaAs multiple quantum wells that are sensitive at wavelengths near 1.06 mum for what is believed to be the first time. We have measured four-wave-mixing diffraction efficiency, using a Nd:YAG laser. A maximum diffraction efficiency of 7 x 10(-4) and a cutoff grating period of ~2 mum are obtained. |
| Keywords: | |
| 本文献已被 PubMed 等数据库收录！ | |