负离子元素杂质破坏模型

探讨了HfO₂薄膜中负离子元素杂质破坏模型，并得出薄膜中的杂质主要来源于 镀膜材料. 用电子束蒸发方法沉积两种不同Cl元素含量的HfO₂薄膜，测定薄膜 弱吸收和损伤阈值来验证负离子元素破坏模型. 结果表明，随着Cl元素含量的增加薄膜的弱 吸收增加损伤阈值减小. 这主要是因为负离子元素在蒸发过程中形成挥发性的气源中心而产 生缺陷，缺陷在激光辐照过程中又形成吸收中心. 因此负离子元素的存在将加速薄膜的破坏 . 关键词： 负离子元素杂质 缺陷 吸收

Negative-ion element impurities breakdown model

Negative-ion element impurities breakdown model of HfO₂ optical thin film is reported. We believe the main impurity element in thin film comes from t he coating material. The weak absorption and laser induced damage threshold (LID T) of HfO₂ thin film are measured to testify the negative-ion element impurities breakdown model. These results indicate that the LIDT would decrease and the absorption of the films would increase with the increase of the content of negative-ion element. The main reason is the negative-ion elements become th e center of volatile gas source and form defects, which in turn become the cente r of absorption during laser irradiation. So negative-ion elements are harmful i mpurities, their existence will speed up the damage of the thin film.