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Surface pre-melting and surface flattening of Bi nanofilms on Si(1 1 1)-7 × 7 |
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| Authors: | S YaginumaT Nagao JT SadowskiA Pucci Y FujikawaT Sakurai |
| Institution: | a Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan b Precursory Research for Embryonic Science and Technology (PRESTO), Japan Science and Technology Corporation (JST), Saitama 332-0023, Japan c Kirchhoff-Institut für Physik, Ruprecht-Karls-Universität Heidelberg, D-69120 Heidelberg, Germany |
| Abstract: | We report on the in situ observation of temperature-driven drastic morphology evolution and surface pre-melting of the Bi(0 0 1) nanofilm deposited on the Si(1 1 1)-7 × 7 surface by use of spot-profile-analyzing low-energy electron diffraction (SPA-LEED). Surface step density of the single-crystalline, epitaxial Bi(0 0 1) film decreases above 350 K in a critical manner. On annealed Bi(0 0 1) films, we have detected surface pre-melting with a transition temperature of 350 K, which yields reversible diffraction intensity drop in addition to the harmonic Debye-Waller behavior. The observed surface flattening of the as-deposited film is driven by the increased amount of mobile adatoms created through the surface pre-melting. |
| Keywords: | Surface melting Surface structure morphology roughness and topography Surface thermodynamics (including phase transitions) Low energy electron diffraction (LEED) Metallic films Bismuth |
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