Generation of H− ions in a low-pressure xenon-hydrogen discharge. I |
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Authors: | F. G. Baksht V. G. Ivanov |
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Affiliation: | (1) Ioffe Physicotechnical Institute, Russian Academy of Sciences, St. Petersburg, 194021, Russia |
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Abstract: | A theory of a low-pressure discharge in a xenon-molecular hydrogen mixture is developed. It is shown that, in such a discharge, at an interelectrode distance of L = 1 cm and a total plasma pressure of p 0 ~ 1 Torr, the density of negative hydrogen ions produced via the dissociative attachment of thermal electrons to vibrationally excited molecules H2 can reach a value as high as NH ? ≥ 1012 cm?3. According to calculations, the electron temperature in discharge operating regimes under study attains T e ≈ 1?2 eV, which corresponds to the maximum of the e-v exchange rate constant of H2 molecules. This ensures a relatively high rate of vibrational pumping of H2 molecules in the discharge. |
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