Some analytical characteristics of an argon—nitrogen d.c. plasma arc for emission spectrometry |
| |
Authors: | Y. Fujishiro M. Kubota R. Ishida |
| |
Affiliation: | National Chemical Laboratory for Industry, 1-chome, Higashi, Yatabe, IbarakiJapan |
| |
Abstract: | A low-power d.c. plasma arc device was used to estimate the analytical characteristics of an Ar—N2 plasma arc compared to those of an argon plasma arc. When the flow rate of added nitrogen was varied from 0 to 1 l min-1, the Cd I 228.802-nm line showed a maximum signal-to-background ratio at a nitrogen flow rate of approximately 0.3 1 min-1 which corresponds to 0.23% of the total argon flow rate. Ratios of the signal intensities with the Ar—0.23%N2 and argon plasma arcs are given for the spectral lines of seventeen elements. Relatively higher ratios were found for the atom lines of the group VIII through IIIA elements in the periodic table. Better precision and lower detection limits were attained for aluminium and cadmium with the Ar—0.23%N2 plasma arc than with the argon plasma arc. |
| |
Keywords: | |
本文献已被 ScienceDirect 等数据库收录! |