使用ECR等离子体沉积和刻蚀非晶碳薄膜

用苯作源气体在一个微波电子回旋共振等离子体系统中沉积了含氢非晶碳薄膜,研究了沉积参数对膜的生长速率的影响.为了探索该种薄膜在干刻蚀工艺过程中用作掩膜的可能性,还研究了它在氧等离子体中的刻蚀性能.结果表明非晶碳膜对于氧等离子体具有高的抗刻蚀性,其刻蚀率不仅与刻蚀的过程参量有关,而且决定于膜的沉积条件.

Deposition and Etching of Amorphous Carbon Films in ECR Plasma

Amorphous hydrogenated carbon films have been deposited with benzene in an electron cyclotron resonance (ECR) plasma system. To approach as a resist in dry etching processing, etching properties of the films in oxygen plasma have been investigated. The results show that amorphous carbon films have high etching resistance against oxygen plasma, and etch rates of the films correlated not only with etching processing parameters, also with deposition conditions.