基于时间控厚离子束溅射技术的宽带减反膜制备

 为了制备满足设计要求的宽角度、宽波段减反膜，利用离子束溅射沉积技术，在时间-功率控厚的模式下，对膜层沉积速率进行了精确修正。在实验中，利用时间-功率控厚的离子束溅射沉积技术，选择HfO₂和SiO₂作为高低折射率组合，在超抛ZF6玻璃基底上制备了宽角度、宽带减反膜，通过对实验后的透过率光谱曲线的数值反演计算，获得膜层厚度修正系数，初步得到了沉积速率随沉积时间变化的规律。利用修正后的沉积参数制备设计的膜系，在0°~30°入射角度下，600~1 200 nm波段的平均透过率达到99%以上。

Fabrication of broadband antireflection coating based on ion beam sputtering deposition technique with time-power monitoring

With the development of optical systems for multi-wavelength and wide-angle range, there is a requirement of the antireflection coating with wide-spectrum and wide-incidence angle range. In this paper, the substrate is super-smooth ZF6 (rms less than 0.6 nm) glass and HfO₂ and SiO₂ are selected as high index and low index materials, respectively. The broadband antireflection coating is designed, for wavelength form 600 to 1 200 nm and incidence angle of 0° to 30°. The influences of refractive index inhomogeneity, error of refractive index and error of layer physical thickness on its transmittance are analyzed. Ion beam sputtering deposition of time-power thickness monitoring is used to manufacture the antireflection coating and the each layer thickness systematic co