|
|||||
|
|
Using photoelectron emission microscopy with hard-X-rays |
|
| Authors: | Y. Hwu W. L. Tsai B. Lai J. H. Je G. H. Fecher M. Bertolo G. Margaritondo |
| Affiliation: | a Institute of Physics, Academia Sinica, Nankang, Taipei, Taiwan, ROC b Institut de Physique Appliquée, Ecole Polytechnique Fédérale, CH-1015 Lausanne, Switzerland c Advanced Photon Source, Argonne National Laboratory, Argonne, IL, USA d Department of Materials Science and Engineering, Pohang University of Science and Technology, Pohang, South Korea e Institut für Physik, Johannes Gutenberg-Universität, Mainz, Germany f Sincrotrone Trieste SCpA, Trieste, Italy |
| Abstract: | We present several successful test cases of using photoelectron emission microscopy (PEEM) for photon energy up to 25 keV. First, the full extended X-ray absorption fine structure analysis was implemented in areas as small as 100 μm2 for transition-metal K edge absorption spectra and, therefore, demonstrated the feasibility of combining structural and chemical analysis with hard-X-ray absorption spectroscopy with high lateral resolution. We also show that PEEM can be used in a transmission (radiography) mode as an imaging detector for hard-X-ray. This approach again leads to the unprecedented 0.3 μm lateral resolution, particularly critical for the use of coherence-based phase contrast techniques in real time X-ray radiology. |
| Keywords: | Photoelectron emission X-ray absorption spectroscopy |
| 本文献已被 ScienceDirect 等数据库收录！ | |