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Computer studies of boron ion channeling in silicon single crystals
Authors:V. A. Eltekov  D. S. Karpuzov  YU. V. Martynenko  E. A. Rubakha  V. A. Simonov  V. E. Yurasova
Affiliation:Physical Department , Moscow State University , Moscow, 117234, U.S.S.R.
Abstract:The motion of 200 keV B ions in the [111] direction in a silicon single crystal has been investigated using a computer simulation method. Profiles of the depth distribution of implanted ions for both an ideal crystal and a crystal with thermal vibrations have been obtained. A study of the defect distribution has been carried out.
Keywords:Ce3+ luminescence  Stokes shift  Crystal field splitting
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