Growth of hexagonal and cubic InN nanowires using MOCVD with different growth temperatures |
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Authors: | Seok-Hyo Yun Yong-Ho RaYoung-Min Lee Ki-Young SongJun-Ho Cha Hong-Chul LimDong-Wook Kim NJ Suthan KissingerCheul-Ro Lee |
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Institution: | School of Advanced Materials Engineering, Engineering College, Research Center for Advanced Materials Development (RCAMD), Chonbuk National University, Deokjin-Dong 664-14, Chonju 561 756, South Korea |
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Abstract: | We have performed a detailed investigation of the metal-organic chemical vapor deposition (MOCVD) growth and characterization of InN nanowires formed on Si(1 1 1) substrates under nitrogen rich conditions. The growth of InN nanowires has been demonstrated by using an ion beam sputtered (∼10 nm) Au seeding layer prior to the initiation of growth. We tried to vary the growth temperature and pressure in order to obtain an optimum growth condition for InN nanowires. The InN nanowires were grown on the Au+In solid solution droplets caused by annealing in a nitrogen ambient at 700 °C. By applying this technique, we have achieved the formation of InN nanowires that are relatively free of dislocations and stacking faults. Scanning electron microscopy (SEM) showed wires with diameters of 90–200 nm and lengths varying between 3 and 5 μm. Hexagonal and cubic structure is verified by high resolution X-ray diffraction (HR-XRD) spectrum. Raman measurements show that these wurtzite InN nanowires have sharp peaks E2 (high) at 491 cm−1 and A1 (LO) at 591 cm−1. |
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Keywords: | A1 Nanostructures A3 MOCVD B1 Nitrides B2 Semiconducting III&ndash V materials |
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