Experimental study and computer simulations of the implantation of laser plasma ions in pulsed electric fields

Results are presented from experimental studies of pulsed plasma flows generated by nanosecond laser pulses with an intensity of 7 × 10⁸ W/cm² from a solid-state target in a strong electric field. The current pulses through the laser target and the depth distributions of the iron ions implanted in a silicon substrate to which a negative high-voltage pulse was applied are measured. The physical processes occurring in laser plasma with an initial iron ion density of 6 × 10¹⁰ cm⁻³ are simulated numerically by the particle-in-cell method for different delay times and different shapes of the accelerating high-voltage pulse. The model developed allows one to calculate the ion flows onto the processed substrate, the electron flows onto the target, and the energy spectra of the implanted ions. The results from computer simulations are found to be in good agreement the experimental data.