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Back Cover: Stabilization of Copper Catalysts for Liquid‐Phase Reactions by Atomic Layer Deposition (Angew. Chem. Int. Ed. 51/2013)
Authors:Brandon J. O'Neill  David H. K. Jackson  Dr. Anthony J. Crisci  Carrie A. Farberow  Fengyuan Shi  Dr. Ana C. Alba‐Rubio  Dr. Junling Lu  Dr. Paul J. Dietrich  Dr. Xiangkui Gu  Dr. Christopher L. Marshall  Prof. Peter C. Stair  Dr. Jeffrey W. Elam  Dr. Jeffrey T. Miller  Prof. Fabio H. Ribeiro  Prof. Paul M. Voyles  Prof. Jeffrey Greeley  Prof. Manos Mavrikakis  Prof. Susannah L. Scott  Prof. Thomas F. Kuech  Prof. James A. Dumesic
Affiliation:1. Department of Chemical and Biological Engineering, University of Wisconsin, Madison, WI 53706 (USA);2. Materials Science Program, University of Wisconsin, Madison, WI 53706 (USA);3. Department of Chemistry & Biochemistry, University of California, Santa Barbara, CA 93106 (USA);4. Department of Chemical Physics, University of Science and Technology of China, Hefei, 230026 (China);5. Department of Chemical Engineering, Purdue University, West Lafayette, IN 47907 (USA);6. Chemical Science and Engineering, Argonne National Laboratory, Argonne, IL 60439 (USA);7. Department of Chemistry, Northwestern University, Evanston, IL 60208 (USA);8. Energy Systems Division, Argonne National Laboratory, Argonne, IL 60439 (USA)
Abstract:
Keywords:atomic layer deposition  biomass  catalyst stability  copper  hydrogenation
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