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Deformation of AlGaN/GaN superlattice layers according to x-ray diffraction data
Authors:R N Kyutt  M P Shcheglov  V Yu Davydov  A S Usikov
Institution:(1) Ioffe Physicotechnical Institute, Russian Academy of Sciences, Politekhnicheskaya ul. 26, St. Petersburg, 194021, Russia
Abstract:Three-crystal x-ray diffractometry is used for structural studies of nitride AlGaN/GaN superlattices (SLs) grown by metal-organic chemical vapor deposition on sapphire with GaN and AlGaN buffer layers with widely varied SL period (from 50 to 3500 Å), Al content in Alx Ga1?x N layers (0.1≤x≤0.5), and buffer layer composition. Satellite peaks characteristic of SLs are well pronounced up to the third order in θ-2θ scans of symmetric Bragg reflections and θ scans of the symmetric Laue geometry. The corresponding curves are well modeled by kinematic formulas. The average SL parameters, as well as the thickness, composition, and strain of individual layers, are determined using a combination of symmetric Bragg and Laue reflections. It is shown that all the samples under study are partially relaxed structures in which the elastic stresses between the entire SL and the buffer layer, as well as between individual layers, are relaxed. The AlGaN layers are stretched and the GaN layers are compressed. The GaN layer compression is larger in magnitude than the AlGaN layer tension because of thermoelastic stresses.
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