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FIBSIMS: A review of secondary ion mass spectrometry for analytical dual beam focussed ion beam instruments
Authors:Lex Pillatsch  Fredrik Östlund  Johann Michler
Affiliation:1. Empa (Swiss Federal Laboratories for Materials Science and Technology), Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland;2. TOFWERK AG, Uttigenstrasse 22, CH-3600 Thun, Switzerland
Abstract:
Secondary ion mass spectrometry (SIMS) is a well-known technique for 3D chemical mapping at the nanoscale, with detection sensitivity in the range of ppm or even ppb. Energy dispersive X-ray spectroscopy (EDS) is the standard chemical analysis and imaging technique in modern scanning electron microscopes (SEM), and related dual-beam focussed ion beam (FIBSEM) instruments. Contrary to the use of an electron beam, in the past the ion beam in FIBSEMs has predominantly been used for local milling or deposition of material. Here, we review the emerging FIBSIMS technique which exploits the focused ion beam as an analytical probe, providing the capability to perform secondary ion mass spectrometry measurements on FIBSEM instruments: secondary ions, sputtered by the FIB, are collected and selected according to their mass by a mass spectrometer. In this way a complete 3D chemical analysis with high lateral resolution
Keywords:FIBSIMS  TOF  SEM  FIB  EDS  3D imaging
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