Hexagonal nanostructures generated by light masks for neutral atoms |
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| Authors: | U. Drodofsky J. Stuhler T. Schulze M. Drewsen B. Brezger T. Pfau J. Mlynek |
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| Affiliation: | Universit?t Konstanz, Fakult?t für Physik, D-78457 Konstanz, Germany, DE
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| Abstract: | 52 Cr, different patterns can be generated. Possible applications using the inherent properties of atom lithography, e.g. the fabrication of photonic bandgap material, are discussed. Received: 10 March 1997/Revised version: 12 May 1997 |
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| Keywords: | PACS: 42.82.Cr 07.77.Gx |
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