| 非晶Nd-Fe薄膜电阻的温度效应与非晶稳定性 |
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| 引用本文： | 吕曼祺,A. WAGENDRISTEL.非晶Nd-Fe薄膜电阻的温度效应与非晶稳定性[J].物理学报,1993,42(5):840-846. |
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| 作者姓名： | 吕曼祺 A. WAGENDRISTEL |
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| 作者单位： | 快凝非平衡合金国家重点实验室中国科学院国际材料物理中心,沈阳110015;维也纳技术大学应用物理研究所,A-1040 Vienna |
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| 摘 要： | 用闪光蒸镀法在77K制备了NdxFe1-x(x=0.06-0.80)非晶薄膜,原位测定了其电阻随温度的变化。结果表明:在0.192和ρ(T)∝T。晶化不是在一个固定的温度,而是在一个温度区间发生。
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| 关 键 词： | 金属玻璃 薄膜 电阻 温度 稳定性 |
| 收稿时间： | 8/3/1992 12:00:00 AM |
TEMPERATURE DEPENDENCE OF ELECTRIC RESISTIVITY OF Nd-Fe AMORPHOUS THIN FILMS AND ITS THERMAL STABILITY |
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| Lü Man-qi,A. WAGENDRISTEL.TEMPERATURE DEPENDENCE OF ELECTRIC RESISTIVITY OF Nd-Fe AMORPHOUS THIN FILMS AND ITS THERMAL STABILITY[J].Acta Physica Sinica,1993,42(5):840-846. |
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| Authors: | Lü Man-qi A WAGENDRISTEL |
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| Abstract: | The NdxFe1-x amorphous thin films with x=0.06-0.80 were prepared at 77 K by flash evaporation. The results show that the amorphous films are stable at room temperature when 0.192 and T untill the crystallization occurs. The crystallization of the amorphous films can not be completed at a certain fixed temperature but over a temperature range. |
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