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Accumulation effect of SiO_2 protective layer on multi-shot laser-induced damage in high-reflectivity HfO_2/SiO_2 coatings |
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| Authors: | Ying Wang Hongbo He Yuan'an Zhao Yongguang Shan Chaoyang Wei Key Laboratory of Materials for High Power Lasers |
| Affiliation: | Ying Wang1,2,Hongbo He1,Yuan'an Zhao1,Yongguang Shan1,and Chaoyang Wei1 1Key Laboratory of Materials for High Power Lasers,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,China 2Graduate University of Chinese Academy of Sciences,Beijing 100049,China |
| Abstract: | The accumulation effects in high-reflectivity(HR) HfO2/SiO2 coatings under laser irradiation are investigated.The HR HfO2/SiO2 coatings are prepared by electron beam evaporation at 1 064 nm.The laser-induced damage threshold(LIDT) are measured at 1 064 nm and at a pulse duration of 12 ns,in 1-on-1 and S-on-1 modes.Multi-shot LIDT is lower than single-shot LIDT.The laser-induced and native defects play an important role in the multi-shot mode.A correlative theory model based on critical conduction band elect... |
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