FREE RADICALS FROM PHOTODECOMPOSITION OF BISPHENOL-A |
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| Authors: | Kimmo Peltonen Antti Zitting Heimo Koskinen Ahti Itkonen |
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| Institution: | Institute of Occupational Health, Department of Industrial Hygiene and Toxicology, Haartmaninkatu 1, SF-00290 Helsinki;University of Kuopio, Department of Industrial Hygiene, P.O. Box-6, SF-70210 Kuopio, Finland |
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| Abstract: | Abstract— Irradiation of 2,2-bis-(4-hydroxyphenyl)-propane (bisphenol-A) with UV light causes photo-decomposition of the compound. Spin-trapping with α-phenyl-N-tert-butyl-nitrone showed that free radicals were cleaved from the molecule. No direct ESR-spectroscopic information concerning the structure of the remaining radical skeleton could be obtained. Gas chromatographic mass spectrometric analysis of the decomposition products indicated the existence of a semiquinone structure following cleavage of a methyl radical from 2,2-bis-4–(hydroxyphenyl)-propane. The capacity of 2,2-bis-(4- hydroxyphenyl)-propane to give rise to radicals might explain its photoallergenic properties. |
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