Low pressure gain measurements in KrF |
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| Authors: | G. J. Hirst M. J. Shaw |
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| Affiliation: | (1) Rutherford Appleton Laboratory, OX11 0QX Chilton, Dicot, UK |
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| Abstract: | ![]()
Optical gain at 248 nm is measured in low pressure krypton/fluorine mixtures excited by an electron-beam. Measurable gain is observed down to a pressure of 50 mbar. Results are compared with the predictions of a simple kinetic model. The application of low pressure operation to ultra high power short pulse amplifiers is discussed. |
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| Keywords: | 42.55 Gp 42.60 By |
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