Sputtering properties for polyimide by vacuum electrospray droplet impact (V‐EDI) using size‐selected cluster ions

Recently, the vacuum electrospray droplet impact (V‐EDI) was developed as a cluster ion beam source in our laboratory. To attain the ion beam stability and compact design of the ion source, a silica nano‐capillary with 15 µm i.d. was used as the emitter of the beam. It was found that stable electrospray was generated from the capillary tip without the use of laser heating when aqueous solution of 20% ethanol was used. The m/z distribution of electrospray droplets was measured by pulsing the primary beam. By assuming that the charged droplets contain 50% of the excess charges defined by the Rayleigh limit equation, the average mass, and charge of the droplets generated by the present V‐EDI are estimated as 2.5 × 10⁸ u and + 625 charges, respectively, i.e. (H₂O)_14,000,000 + 625H]⁶²⁵⁺. By chopping the primary cluster beam, clusters composed of smaller m/z clusters (group 1: G1, (H₂O)_46,000 + 36H]³⁶⁺) and those of larger m/z clusters (group 2: G2, (H₂O)_560,000 + 125H]¹²⁵⁺) were generated. Surface analysis for polyimide (PI) film by X‐ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) was made using G1, G2, and non‐selected cluster beams. No selective etching was observed when G1, G2, and non‐selected beams were used. However, larger surface roughening was observed when smaller size cluster beams were used. This suggests that larger size clusters cure the surface damage caused by the smaller ones. Copyright © 2016 John Wiley & Sons, Ltd.