Comparative study on structure and properties of titanium/silicon mono‐ and co‐doped amorphous carbon films deposited by mid‐frequency magnetron sputtering |
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| Authors: | Jinlong Jiang Hao Huang Qiong Wang Weijun Zhu Junying Hao Weimin Liu |
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| Institution: | 1. Department of Physics, Lanzhou University of Technology, , Lanzhou, 730050 China;2. State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, , Lanzhou, 730000 China |
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| Abstract: | The titanium/silicon mono‐ and co‐doped amorphous carbon films were deposited by mid‐frequency magnetron sputtering Ti target, Si target, and Ti80S20 alloy target, respectively. The effects of doped elements on the composition, surface morphology, microstructure, and mechanical and tribological properties of the films were investigated. The results reveal that the ratio of sp3 and sp2 carbon bonds of the films is regulated between 0.28 and 0.62 by a combination of Ti and Si dopant. The addition of small amounts of silicon leads to an increase in sp3 bonds and disorder degree of the sp2 carbon. The co‐doped film exhibits significantly superior friction performance than the mono‐doped films. The ultra‐low friction (μ < 0.01) was achieved under a load of 2 N in ambient air with 40% RH. By comparing to the mono‐and co‐doped films, it is thought that the sp3/sp2 ratio of the films may play a key role for the superlow friction. Copyright © 2013 John Wiley & Sons, Ltd. |
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| Keywords: | a‐C:H films co‐doping microstructure tribological properties |
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