Emission of secondary ions from 3d, 4d, and 5d transition metals under chloro-trifluoro-methane CClF3 as reactant gas |
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Authors: | Bj?rn Schlosser and W Seidel |
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Institution: | (1) Physikalisch-chemisches Institut, Justus-Liebig-Universit?t Giessen, Heinrich-Buff-Ring 58, D-35392 Giessen, Germany, DE |
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Abstract: | Surface interactions of CClF3 with polycrystalline samples of Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Nb, Mo, Rh, Pd, Ag, Ta, W, Re, Ir, and Pt were investigated
by means of moderate dynamic SIMS. As observed with other reactant gases these transition metals in most cases appear to be
discernible into “dissociative” and (partial) “molecular” adsorbents. Small signals of oxidic secondary ions which are detectable
for residual gas conditions vanished under the action of CClF3. However, due to strong polarization by either of the halogens, the emission of Me2+ ions is enhanced for Ti, V, and Nb.
Received: 6 August 1997 / Revised: 22 December 1997 / Accepted: 29 December 1997 |
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