Ion implantation into fused quartz for integrated optical circuits

Results obtained in the fabrication of slab and strip waveguides by ion implantation into fused quartz are discussed. Using a step-index waveguide model the increase in refractive index is calculated. The optical loss is smaller than 1 dB/cm at λ = 568 nm without annealing. The properties of strip waveguides fabricated by ion implantation through photoresist masks of thicknesses from 0.4 μm to 0.8 μm are described. A bright fluorescence is observed with emission at 530 nm and 640 nm and its dependence on ion fluence and ion energy is measured.